Characteristics of focused beam spots using negative ion beams from a compact surface plasma source and merits for new applications

Citation
Sk. Guharay et al., Characteristics of focused beam spots using negative ion beams from a compact surface plasma source and merits for new applications, J VAC SCI B, 16(6), 1998, pp. 3370-3373
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
16
Issue
6
Year of publication
1998
Pages
3370 - 3373
Database
ISI
SICI code
1071-1023(199811/12)16:6<3370:COFBSU>2.0.ZU;2-L
Abstract
The characteristics of H- beams from a compact Penning-type surface plasma source have been studied with the goal of evaluating their merits for impro ved focused ion beam (FIB) systems. As a proof-of-the principles experiment to demonstrate the beam quality a simple, prototype source was developed w ithout any special cooling arrangement of the electrodes. The source is ope rated in a pulsed mode with a maximum duty factor of 1%; and the operation can be extended to the de mode by using water cooling. The beam brightness is estimated to be similar to 0.5x10(5) A cm(2) sr(-1) at a beam energy of 7 kV, and the energy spread of the beam for angular beam intensity of simil ar to 40 mA/sr is less than or equal to 3 eV. The beam at an energy of 7 ke V has been focused by a lens with a magnification factor of M similar to 0. 1, and the spot size is determined by scanning a Si knife edge over the bea m as well as by poly(methylmethacrylate) resist exposures. A focused spot, with diameter of similar to 6 mu m and current density of similar to 10 mA/ cm(2), has been achieved. The dependence of the spot characteristics with t he beam intensity from the source has been studied. The results suggest tha t a submicron size spot with a current density of similar to 1 A/cm(2) can be generated using these beams for M similar to 0.01. The source, with its simple, robust technology, seems an attractive choice for FIB applications. (C) 1998 American Vacuum Society.