Edge diffraction enhanced printability in x-ray nanolithography

We study the edge diffraction enhanced printability in x-ray nanolithograph y under both proximity and soft-contact printing conditions. Theoretical mo deling shows that the gap dependence of the edge diffraction is closely rel ated to that bf the minimum linewidth described by the common Fresnel formu la and that the edge diffraction can significantly enhance the image contra st of nanometer scale features. Experimental results are also presented to show high resolution and high aspect ratio printability. Furthermore, a met hod for fabricating ultrahigh resolution and dense structure is discussed b ased on edge diffraction enhanced printability with very thin absorber mask s. (C) 1998 American Vacuum Society. [S0734-211X(98)07706-3].