Improving pattern placement using through-the-membrane signal monitoring

Citation
Fk. Perkins et al., Improving pattern placement using through-the-membrane signal monitoring, J VAC SCI B, 16(6), 1998, pp. 3567-3571
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
16
Issue
6
Year of publication
1998
Pages
3567 - 3571
Database
ISI
SICI code
1071-1023(199811/12)16:6<3567:IPPUTS>2.0.ZU;2-I
Abstract
We describe here a means of improving pattern placement accuracy in the ele ctron-beam lithographic manufacture of membrane masks. Our method is based on collection of the beam transmitted through the membrane with a detector fixed to the mask assembly. A fiducial grid overlaid onto the detector is u sed to provide a global reference for measurement of the beam position duri ng lithographic patterning. We give results from-recent experiments with co mponents of such a system, and estimate I sigma accuracy in our method to b e on the order of 1.5 nm. We discuss the effect of beam scattering on our t echnique, and possible improvements in our implementation. [S0734-211X(98)0 3606-3].