Absorptive masks of light: A useful tool for spatial probing in atom optics

Citation
C. Keller et al., Absorptive masks of light: A useful tool for spatial probing in atom optics, J VAC SCI B, 16(6), 1998, pp. 3850-3854
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
16
Issue
6
Year of publication
1998
Pages
3850 - 3854
Database
ISI
SICI code
1071-1023(199811/12)16:6<3850:AMOLAU>2.0.ZU;2-9
Abstract
We demonstrate periodic localization of neutral atoms of better than 65 nm behind amplitude, i.e., absorptive masks made of light. With these masks, p roduced by a standing on resonant light wave, it is possible to-create and to probe spatially well-defined atomic distributions. Applications of such absorptive masks range from atom lithography to fundamental atom optical ex periments. As two examples we show how to use these gratings as a tool to m easure the evolution of an atomic wave held behind a static Bragg crystal a nd its dependence on the incidence angle of the atomic beam and how to demo nstrate the frequency shift of atoms diffracted at a modulated Bragg crysta l in a beating experiment. (C) 1998 American Vacuum Society. [S0734-211X(98 )18706-1].