Artificial dielectric optical structures: A challenge for nanofabrication

Citation
C. Giaconia et al., Artificial dielectric optical structures: A challenge for nanofabrication, J VAC SCI B, 16(6), 1998, pp. 3903-3905
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
16
Issue
6
Year of publication
1998
Pages
3903 - 3905
Database
ISI
SICI code
1071-1023(199811/12)16:6<3903:ADOSAC>2.0.ZU;2-6
Abstract
Diffractive optical components can be made using multiple level kinoforms o r single level artificial dielectric structures. The latter require the fab rication of pillars of equal depth but differing width and spacing. As a de monstration device, the diffractive optic equivalent of a wedge has been ma de in GaAs for use at 1.15 mu m. The need for all pillars to have the same height was met by using a selective etch and a very thin etch-stop layer on AlGaAs. The experimental diffraction efficiency was 87.8%, among the best ever obtained and close to the theoretical maximum of 97.6%. (C) 1998 Ameri can Vacuum Society. [S0734-211X(98)03706-8].