Roller nanoimprint lithography

An alternative approach to flat nanoimprint lithography (NIL)-roller nanoim print lithography (RNIL) is demonstrated. Compared with flat NIL, RNIL has the advantage of better uniformity, less force, and the ability to repeat a mask continuously bn a large substrate. Two methods for RNIL are developed : (a) rolling a cylinder mold on a flat, solid substrate; (b) putting a hat mold directly on a substrate and rolling a smooth roller on top of the mol d. Using our current roller nanoimprint system, sub-100 nm resolution patte rn transfer has been achieved. (C) 1998 American Vacuum Society. [S0734-211 X(98)18606-7].