Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy
T. Gotszalk et al., Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy, J VAC SCI B, 16(6), 1998, pp. 3948-3953
The fabrication and performance of a microprobe with multipurpose capabilit
ies for scanning probe microscopy is presented in this article. Atomic forc
e microscopy (AFM), scanning capacitance microscopy, and electrostatic forc
e microscopy measurements can be simultaneously performed with the probe in
which a silicon tip is integrated with a piezoresistive cantilever. Fabric
ation of the microprobe is based on double side bulk/surface micromachining
of silicon on insulator (SOI) substrates. The novelty of this device is a
highly doped silicon tip with a curvature radius of about 20 nm which is el
ectrically isolated from the silicon cantilever by the buried oxide layer o
f the SOI substrate. At the beam supporting point a piezoresistive Wheatsto
ne bridge is fabricated to allow the deflection of the microtip to be monit
ored. This cantilever displacement detection system enables measurements in
vacuum and simplifies the design of the AFM head. Experimental measurement
s agree well with theoretical estimates of the sensitivity of the microprob
e. (C) 1998 American Vacuum Society. [S0734-211X(98)18506-2].