Analysis of small-bore copper-vapor laser by physical simulation

Citation
Dl. Yu et al., Analysis of small-bore copper-vapor laser by physical simulation, MICROW OPT, 20(1), 1999, pp. 56-63
Citations number
7
Categorie Soggetti
Optics & Acoustics
Journal title
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
ISSN journal
08952477 → ACNP
Volume
20
Issue
1
Year of publication
1999
Pages
56 - 63
Database
ISI
SICI code
0895-2477(19990105)20:1<56:AOSCLB>2.0.ZU;2-Y
Abstract
The copper-vapor laser physical simulation code applied to different diamet er small-bore copper-vapor laser (CVL) is described The kinetic equations, coefficients, and initial parameters of population density are presented Th e discharge and lasing characteristics of the copper-vapor laser tenner a s eries of operation conditions are discussed. Good agreement exists between the theoretical and experimental results. As a calculation result, the popu lation densities of the laser upper and lower level under different chargin g voltage for a 4 cm diameter laser operation condition are presented An av alanche of the upper laser level population density appears as the exciting voltage increases, so the optimized charging voltage when the laser outpow er is maximum can be explained exactly (C) 1999 John Wiley & Sons, Inc.