X-ray masks

Authors
Oda, M Uchiyama, S Okada, I Ohkubo, T
Citation
M. Oda et al., X-ray masks, NTT REVIEW, 10(6), 1998, pp. 60-64
Citations number
6
Categorie Soggetti
Information Tecnology & Communication Systems
Journal title
NTT REVIEW
ISSN journal
09152334 → ACNP
Volume
10
Issue
6
Year of publication
1998
Pages
60 - 64
Database
ISI
SICI code
0915-2334(199811)10:6<60:XM>2.0.ZU;2-I
Abstract
SR lithography is a technology for exactly replicating absorber patterns on X-ray masks to resist films with the same size. The quality of the X-ray m asks directly influences the quality of the replicated patterns. Hence, X-r ay masks must have absorber patterns with highly accurate placement and wid th, and without defects. This article describes technologies for producing highly accurate X-ray masks.