Electron beam writing system for X-ray masks

Authors
Shimazu, N Morosawa, T Saito, K Kunioka, T Takeda, Y Watanabe, T
Citation
N. Shimazu et al., Electron beam writing system for X-ray masks, NTT REVIEW, 10(6), 1998, pp. 65-69
Citations number
1
Categorie Soggetti
Information Tecnology & Communication Systems
Journal title
NTT REVIEW
ISSN journal
09152334 → ACNP
Volume
10
Issue
6
Year of publication
1998
Pages
65 - 69
Database
ISI
SICI code
0915-2334(199811)10:6<65:EBWSFX>2.0.ZU;2-K
Abstract
The replication of LSI mask patterns on a wafer using X-rays requires an ex tremely accurate X-ray mask on which an enormous number of fine patterns mu st be accurately written. NTT has been developing an e-beam writer that dra ws mask patterns with an electron beam.