DEEP LEVELS IN P(-N JUNCTIONS FABRICATED BY RAPID THERMAL ANNEALING OF MG OR MG())P IMPLANTED INP/

In this work, we investigate the deep levels present in ion implanted and rapid thermal annealed (RTA) InP p(+)-n junctions. The samples wer e implanted with magnesium or coimplanted with magnesium and phosphoru s. These levels were characterized using deep level transient spectros copy (DLTS) and capacitance-voltage transient technique (CVTT). Seven majority deep levels located in the upper half of the band gap were de tected in the junctions by using DLTS measurements, four of which (at 0.6, 0.45, 0.425, and 0.2 eV below the conduction band) result from RT A, while the origin of the other three levels (at 0.46, 0.25, and 0.27 eV below the conduction band) can be ascribed to implantation damage. An RTA-induced origin was assigned to a minority deep level at 1.33 e V above the valence band. From CVTT measurements, several characterist ics of each trap were derived. Tentative assignments have been propose d for the physical nature of all deep levels. (C) 1997 American Instit ute of Physics.