Synthesis and properties of silicon-containing maleimide polymers based onN-(trimethylsilyl) maleimide

N-(Trimethylsilyl)maleimide (TMSMI) has been polymerized with various styre nic monomers (XSt) in the presence of a radical initiator to give high-mole cular-weight, alternating copolymers in high yields. The copolymers P(TMSMI /XSt) have high glass transition temperatures above 200 degrees C and therm al decomposition temperatures in the range 320-360 degrees C. The thermal a nd acidolytic deprotection of trimethylsilyl (TMS) groups of TMSMI units in the copolymers have been investigated. UV irradiation and subsequent heati ng of a film of P(TMSMI/t-BOCSt) containing a photoacid generator resulted in deprotection of the protecting groups by the photogenerated acids, there by causing a significant change in solubility of the polymer. Thus positive image patterns were obtained with P(TMSMI/t-BOCSt) by photolithographic pr ocesses. (C) 1998 Society of Chemical Industry.