Promising conditions for thick-film anodic oxidation of aluminum substrates with submillimeter vias

Authors
Seryanov, YV Fomenko, LA
Citation
Yv. Seryanov et La. Fomenko, Promising conditions for thick-film anodic oxidation of aluminum substrates with submillimeter vias, PROT MET R, 34(6), 1998, pp. 556-558
Citations number
5
Categorie Soggetti
Metallurgy
Journal title
PROTECTION OF METALS
ISSN journal
00331732 → ACNP
Volume
34
Issue
6
Year of publication
1998
Pages
556 - 558
Database
ISI
SICI code
0033-1732(199811/12)34:6<556:PCFTAO>2.0.ZU;2-A
Abstract
The optimum process of the high-quality thick-film anodic oxidation of alum inum substrates with submillimeter vias to fabricate microwave hybrid-circu it boards is suggested.