Dependence of the contrast ratio on crystal thickness in an electroabsorptive spatial light modulator that uses GaAs

Citation
Y. Bitou et T. Minemoto, Dependence of the contrast ratio on crystal thickness in an electroabsorptive spatial light modulator that uses GaAs, APPL OPTICS, 37(35), 1998, pp. 8227-8232
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
37
Issue
35
Year of publication
1998
Pages
8227 - 8232
Database
ISI
SICI code
0003-6935(199812)37:35<8227:DOTCRO>2.0.ZU;2-U
Abstract
The contrast ratio of an optically addressed spatial light modulator that u ses electroabsorption in a GaAs single crystal is discussed experimentally and theoretically. The modulator has the same structure as a Pockels readou t optical modulator. The contrast ratio depends strongly on the change in t he absorption coefficient and on the thickness of the GaAs crystal. From th e experimental results and from theoretical investigations of the Franz-Kel dysh effect, the change in the absorption coefficient is estimated by use o f the quadratic equation of an applied electric field that is not excessive ly strong. Under this condition, an optimum thickness of the GaAs crystal p late that will yield the maximum contrast ratio can be determined. (C) 1998 Optical Society of America.