Etching of thin films using magnetised plasmas

This presentation overviews a few characteristics of high frequency magneto plasma sources that have been designed for applications to etching of thin films. The present needs in terms of etching performances are presented as well as a brief description of some of these plasma sources. A few etching process that have been succeeding with these sources are presented. From th ese results, we conclude that all these sources have their figure of merit and that all of them can be designed so as to provide similar etching chara cteristics.