Diagnostics of deposition plasmas

Citation
Dc. Schram et al., Diagnostics of deposition plasmas, J PHYS IV, 8(P7), 1998, pp. 217-230
Citations number
32
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
8
Issue
P7
Year of publication
1998
Pages
217 - 230
Database
ISI
SICI code
1155-4339(199810)8:P7<217:DODP>2.0.ZU;2-N
Abstract
The diagnostics of plasmas used for deposition of thin layers and for the m odification of surfaces are summarised. First the various processes are dis cussed: plasma production, the fragmentation of injected monomers, the tran sport of radicals, the processes at the surface and the desorption of new m onomers in wall association. All these processes have characteristic time c onstants, short for the plasma processes and long for processes, which invo lve wall interactions and recirculation in the deposition chamber. Several typical results are given, which elucidate the processes and the applicabil ity of diagnostics.