Infrared absorption analysis of organosilicon/oxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance

The dissociation of 4 groups of organosilicon monomers (such as hexamethydi siloxane, tetraethoxysilane, tetramethylsilane or tetramethoxysilane) in a MMP DECR reactor is analyzed by infrared absorption spectroscopy. The paren t molecules are totally dissociated above 100 watts. The daughter stable mo lecules, such as C2H2, CH4, CO2, CO, C2H4 and OCH2 have been detected at lo w power but are dissociated at higher power. Each group exhibits its very o wn characteristics of dissociation as well as production of new species dep ending an its chemical composition. It seems that the DECR plasma at high e nergy dissociates the monomer molecule into its constituent atoms.