Role of the plasma composition at the surface on diamond growth

The predominant role of hydrogen atoms and CH3 radicals in diamond growth m echanism in moderate pressure reactors is now generally accepted. Measuring the densities of these species at the growing diamond surface, as a functi on of the deposition parameters is essential for predicting growth rate, fi lm morphology and quality. Since experimental measurements of CH3 radicals are difficult, we have chosen to develop model able to run in H-2 + CH4 pla sma. This model predicts plasma and surface composition as well as growth r ate. It is partially validate with experimental measurements of H-atoms and growth rates.