Magnetic properties of epitaxial Fe(Si1-xFex) films grown on Si(111)

Citation
D. Berling et al., Magnetic properties of epitaxial Fe(Si1-xFex) films grown on Si(111), J MAGN MAGN, 191(3), 1999, pp. 331-338
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
191
Issue
3
Year of publication
1999
Pages
331 - 338
Database
ISI
SICI code
0304-8853(199901)191:3<331:MPOEFF>2.0.ZU;2-U
Abstract
Iron silicide thin films (200 Angstrom Fe(Si1-xFex) with 0 less than or equ al to x less than or equal to 1 and local cubic CsCl structure) have been g rown by coevaporation at room temperature (RT) on Si(1 1 1). X-ray magnetic circular dichroism (XMCD) and magneto-optic Kerr effect (MOKE) measurement s indicate that the films are ferromagnetic at RT for x ranging from 1 (pur e Fe) to 0.15 (Fe1.35Si). The magnetization is parallel to the him surface, and the magnetic anisotropy is uniaxial, with the easy axis lying along a [(1) over bar 0 1](Si) crystallographic direction and the hard axis along a [1 (2) over bar 1](Si) direction of the substrate. MOKE measurements show that the magnitude of the saturation field increases with increasing Si con centration, while XMCD data indicate that the average local magnetic moment carried by the Fe atoms decreases with decreasing Fe concentration. Models which involve the diminution of the number of Fe nearest neighbors are pro posed for the description of the behavior of the Fe moments. (C) 1999 Elsev ier Science B.V. All rights reserved.