Epitaxial growth and strain of manganite thin films

Citation
Y. Konishi et al., Epitaxial growth and strain of manganite thin films, MAT SCI E B, 56(2-3), 1998, pp. 158-163
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
56
Issue
2-3
Year of publication
1998
Pages
158 - 163
Database
ISI
SICI code
0921-5107(19981106)56:2-3<158:EGASOM>2.0.ZU;2-4
Abstract
Thin films of La1-xSrxMnO3 (x = 0.4) were fabricated using pulsed laser dep osition (PLD) method on various substrates for investigation of the effect of strain induced by lattice mismatch on the electro-magnetic properties. T he growth conditions were optimized on SrTiO3, substrate which has the best lattice matching (+ 0.9%) among the substrates used in this study. The res istivity and magnetization of thick films ( > 6 nm) on SrTiO3, were compara ble to those of bulk single crystals. With increasing the lattice mismatch by using LaAlO3, (-2.0%), the resistivity increased to show insulating beha vior caused by biaxial strain due to coherent epitaxial growth. However, fu rther increase of mismatch for NdAlO3, (-3.1%) and YAlO3, (-4.0%) made it p ossible to relax partly the strain, resulting in highly conductive films. ( C) 1998 Elsevier Science S.A. All rights reserved.