ROOM-TEMPERATURE SILICON-WAFER BONDING WITH ULTRA-THIN POLYMER-FILMS

Citation
G. Krauter et al., ROOM-TEMPERATURE SILICON-WAFER BONDING WITH ULTRA-THIN POLYMER-FILMS, Advanced materials, 9(5), 1997, pp. 417
Citations number
29
Categorie Soggetti
Material Science
Journal title
ISSN journal
09359648
Volume
9
Issue
5
Year of publication
1997
Database
ISI
SICI code
0935-9648(1997)9:5<417:RSBWUP>2.0.ZU;2-#
Abstract
Bonding of silicon wafers is required in microelectronics fabrication, for example. A room-temperature bonding process that leads to suffici ent bond strength is necessary for bonding semi-processed wafers: i.e. , those already containing temperature-sensitive structures. The room- temperature bonding of hydrophobic wafers is reported for the first ti me, an ultra-thin Langmuir-Blodgett film of a ''hairy'' rod-like polym er being used as an intermediate layer. The effect of the polymer laye r on the surface roughness is investigated and possible directions of future work are indicated.