Quantitative wear analysis using atomic force microscopy

Citation
J. Schofer et E. Santner, Quantitative wear analysis using atomic force microscopy, WEAR, 222(2), 1998, pp. 74-83
Citations number
8
Categorie Soggetti
Material Science & Engineering
Journal title
WEAR
ISSN journal
00431648 → ACNP
Volume
222
Issue
2
Year of publication
1998
Pages
74 - 83
Database
ISI
SICI code
0043-1648(199811)222:2<74:QWAUAF>2.0.ZU;2-2
Abstract
A new method is presented to measure the volume of locally restricted topog raphical changes on surfaces due to wear with ultra-high precision. For thi s purpose a so-called stand-alone atomic force microscope (AFM) is used in combination with a special sample holder that allows to observe the same se ction of the sample surface before and after tribological stressing in a co nventional tribometer. Exceeding the resolution limits of standard profilom etry by far, the AFM I can be used for quantifying smallest wear events and gives new insights in the details of the tribological process. As examples , measurements of hardness indentations on a Si wafer, as well as wear even ts due to sliding motion on an AuNi coating and filled polymers for electri cal contact systems are shown. In addition, some practical aspects such as avoiding measurement errors and possible applications are discussed in deta il. (C) 1998 Published by Elsevier Science S.A. All rights reserved.