S. Kuntzinger et al., Distribution and topology of the electron density in an aluminosilicate compound from high-resolution x-ray diffraction data: the case of scolecite, ACT CRYST B, 54, 1998, pp. 819-833
The experimental electron density distribution in scolcite, CaAl2Si3O10.3H(
2)O, has been derived from single-crystal high-resolution Ag K alpha X-ray
diffraction data. A statistical method based on the prediction matrix has b
een used to discuss the estimation of the valence populations (P-val) in th
e kappa least-squares refinements. The densities on the Si-O-Si and SiO-Al
bridges have been characterized using the topology of the electron density
through its Laplacian at the bond critical points. The Si-O and Al-O bond f
eatures are related to the atomic environment and to the Si-O-T geometries
(T = Si, Al).