A RETROSPECTIVE ON 2-NITROBENZYL SULFONATE PHOTOACID GENERATORS

Authors
HOULIHAN FM NALAMASU O KOMETANI JM REICHMANIS E
Citation
Fm. Houlihan et al., A RETROSPECTIVE ON 2-NITROBENZYL SULFONATE PHOTOACID GENERATORS, Journal of imaging science and technology, 41(1), 1997, pp. 35-40
Citations number
27
Categorie Soggetti
Photographic Tecnology
Journal title
Journal of imaging science and technology → ACNP
ISSN journal
10623701
Volume
41
Issue
1
Year of publication
1997
Pages
35 - 40
Database
ISI
SICI code
1062-3701(1997)41:1<35:ARO2SP>2.0.ZU;2-H
Abstract
An overview on the utility of 8-nitrobenzyl sulfonate photoacid genera tors (FAG) in chemically amplified deep UV (248 nm) photoresists is pr esented. This article will detail how structural changes in photoacid generators affect properties such as quantum yield, thermal stability, etc., and will also illustrate how these properties influence the lit hographic characteristics of photoresist formulations.