Near-threshold gain mechanisms in GaN thin films in the temperature range of 20-700 K

Citation
S. Bidnyk et al., Near-threshold gain mechanisms in GaN thin films in the temperature range of 20-700 K, APPL PHYS L, 74(1), 1999, pp. 1-3
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
1
Year of publication
1999
Pages
1 - 3
Database
ISI
SICI code
0003-6951(19990104)74:1<1:NGMIGT>2.0.ZU;2-R
Abstract
We report the results of an experimental study on near-threshold gain mecha nisms in optically pumped GaN epilayers in the temperature range of 20-700 K. High-quality single-crystal GaN films grown on 6H-SiC and (0001) sapphir e were used in this study. We show that the dominant near-threshold gain me chanism is inelastic exciton-exciton scattering for temperatures below simi lar to 150 K, characterized by band-filling phenomena and a low stimulated emission (SE) threshold. An analysis of both the temperature dependence of the SE threshold and the relative shift between stimulated and band-edge-re lated emission indicates electron-hole plasma is the dominant gain mechanis m for temperatures exceeding 150 K. Based on our results, we discuss possib ilities of reducing the room-temperature lasing threshold in laser diode st ructures with a GaN active medium. (C) 1999 American Institute of Physics. [S0003-6951(99)01401-1].