Quantum confinement effect in self-assembled, nanometer silicon dots

Citation
Sa. Ding et al., Quantum confinement effect in self-assembled, nanometer silicon dots, APPL PHYS L, 73(26), 1998, pp. 3881-3883
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
73
Issue
26
Year of publication
1998
Pages
3881 - 3883
Database
ISI
SICI code
0003-6951(199812)73:26<3881:QCEISN>2.0.ZU;2-0
Abstract
The first subband energy at the valence band of self-assembled silicon quan tum dots grown by low-pressure chemical vapor deposition on ultrathin SiO2/ Si substrates has been measured as an energy shift at the top of the valenc e band density of states by using high-resolution x-ray photoelectron spect roscopy. The systematic shift of the valence band maximum towards higher bi nding energy with decreasing the dot size is shown to be consistent with th eoretical prediction. The charging effects of the silicon dots and the SiO2 layer by photoelectron emission during the measurements have been taken in to account in determining the valence-band-edge energy. (C) 1998 American I nstitute of Physics. [S0003-6951(98)02052-X].