R. Leon et al., ELECTRICAL-ACTIVITY AND PRECIPITATION BEHAVIOR OF COPPER IN GALLIUM-ARSENIDE, Applied physics A: Materials science & processing, 61(1), 1995, pp. 7-16
The electrical properties and preferred lattice site of Cu in GaAs wer
e investigated combining electrical and optical measurements with ion
beam and structural analysis. From this comprehensive study it was det
ermined that Cu introduces two levels in the band gap, that the concen
tration of electrically active centers introduced by Cu diffusion is c
onsiderably smaller than the total Cu concentration, that this ratio o
f electrically active to total Cu concentration depends strongly on th
e cooling speed after diffusion, and that the portion of Cu that remai
ns electrically inactive forms Cu-Ga precipitates.