Platinum, palladium and rhodium complexes as volatile precursors for depositing materials

This article reviews the transition-metal complexes of rhodium, palladium a nd platinum which were described in the literature as volatile. A classific ation has been adopted according to the ligands borne by each metal center, and the preparation procedures have been given. As the general aim of the review is to use the most convenient complexes for chemical vapor depositio n, the yields of the syntheses and the stability and/or sensitivity of the complexes have been emphasized. When appropriate, their use in CVD and a de tailed description of the resulting deposits have been reported. Challenges for researchers iu the field are discussed (C) 1998 Elsevier Science S.A. All rights reserved.