Observation of two-step excitation of photoluminescence in silicon nanostructures

Citation
La. Golovan et al., Observation of two-step excitation of photoluminescence in silicon nanostructures, JETP LETTER, 68(10), 1998, pp. 770-774
Citations number
7
Categorie Soggetti
Physics
Journal title
JETP LETTERS
ISSN journal
00213640 → ACNP
Volume
68
Issue
10
Year of publication
1998
Pages
770 - 774
Database
ISI
SICI code
0021-3640(19981125)68:10<770:OOTEOP>2.0.ZU;2-E
Abstract
Efficient visible-range photoluminescence with photon energy higher than th e photon energy of the exciting radiation is observed in nanostructures of porous silicon subjected to heat treatment in vacuum. The photoluminescence intensity is found to be virtually identical for cw and femtosecond excita tion by Ti:sapphire laser radiation with the same average power. The result s can be explained by a two-step cascade photoluminescence excitation proce ss in which optical passivation of defects of the dangling silicon bond typ e occurs. (C) 1998 American Institute of Physics. [S0021-3640(98)00322-3].