Structural characterization and residual stresses of AlN films by X-ray diffraction analysis

The mechanical state in thin films considerably influences their macroscopi c properties, especially their tribological behaviour. It is the reason why microstrains and residual stresses determination is very important. This p aper deals with the characterization by X-ray diffraction of the microstruc tural and mechanical state of aluminum nitride layers elaborated by two kin ds of processing : laser induced plasma aluminum nitriding and magnetron sp uttering deposition. Results show no preferential orientation and residual stresses in laser-plasma AlN films while deposits offer preferential growth direction and high stresses from thermal ones.