Impact of X-ray fluorescence spectrometry and low-energy electron-induced X-ray spectrometry on the analysis of plasma-assisted chemical vapor deposition of silica on steel

Organosilane thin films deposited by "plasma polymerization" (PACVD process ) on stainless steel substrates have been investigated by two x-ray emissio n methods (XRFS and LEEIXS). Thickness measurement was performed by XRFS an d composition or chemical effect variations were determined by LEEIXS as a function of various experimental parameters. The latter method, very sensit ive to the detection of light elements, has allowed to optimize the deposit ion conditions and to obtain pure silica films.