X-ray emission characterization of carbon and carbon nitride films obtained by physical vapor deposition

This work deals with carbon and carbon nitride thin film deposition on stai nless steel substrates Such films were obtained by PVD methods magnetron sp uttering and laser ablation of a graphite target under inert or reactive at mosphere Film characterisation (chemical composition. thickness) was perfor med by low-energy electron induced x-ray spectrometry (LEEIXS) Correspondin g analyses were carried out by measuring CK alpha, NK alpha, OK alpha and F eL alpha intensities as a function of an experimental parameter (nature of the sputtering gas, partial pressure of the reactive gas. power and fluence supplied, deposition time,,) Given that the high sensitivity of LEEIXS tow ards production and detection of low energy x-ray radiations. deposition pa rameters are easily optimised.