X-ray emission analysis of copper oxide films formed on copper substrates

The present work has been aimed at optimizing a chemical oxidation process of copper substrates for microelectronics applications (adhesion improvemen t at the polymer/metal interface) Analysis of the so-formed oxide films was carried out by low-energy electron-induced x-ray spectrometry (LEEIXS) and x-ray photoelectron spectrometry (XPS) Considerable information was obtain ed about chemical composition and thickness of oxide films and correlated w ith the elaboration parameters (temperature of the oxidizing bath. treatmen t time ...).