Microstructural analysis of thin Ti-B-N coatings obtained by magnetron cathodic sputtering

X-Ray diffraction is used to study microstructural evolution of Ti-B-N coat ings elaborated by reactive magnetron cathodic sputtering. Influence of bia s parameters, such as bias potential and ionic current density on microstru cture, is precisely studied. Microstrains and macrostresses increase with b ias power. Crystallite size is influenced by the number of ions which bomba rd the growing coating but also by their energy. A local maximum stress is obtained for the hardest coating. It corresponds to the denser film. Theref ore, the stress relaxation is weak.