Plasma chemistry aspects of a-Si : H deposition using an expanding thermalplasma (vol 84, pg 2426, 1998)

Authors
van de Sanden, MCM Severens, RJ Kessels, WMM Meulenbroeks, RFG Schram, DC
Citation
Mcm. Van De Sanden et al., Plasma chemistry aspects of a-Si : H deposition using an expanding thermalplasma (vol 84, pg 2426, 1998), J APPL PHYS, 85(2), 1999, pp. 1243-1243
Citations number
1
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
2
Year of publication
1999
Pages
1243 - 1243
Database
ISI
SICI code
0021-8979(19990115)85:2<1243:PCAOA:>2.0.ZU;2-R