Co-Sm and Co-Pr films were deposited by de magnetron sputtering. Transmissi
on electron microscopy and magnetic measurement were used to study the micr
ostructure and magnetic propel-ty relationship. The nanostructure of the as
-deposited Co 19 at. % Sm films consists of two phases: the amorphous phase
and the crystallite phase. Upon annealing at 600 degrees C, the Co5Sm phas
e with the Cu5Ca structure, having grain size of about 20 nm, is obtained a
long with high coercivity (45 kOe), The as-deposited Co 22 at. % Sm films a
lso have nanostructure similar to the Co 19 at. % films except the volume f
raction of the crystallite is reduced. This is related to the concentration
of Sm which promotes the formation of the amorphous phase. A new metastabl
e phase Co3Sm is formed upon annealing of the Co 22 at. % Sm film at 500 de
grees C. This phase has the DO19, structure in which the Sm atoms take orde
red positions of a triangular pattern in the close-packed planes. A relativ
ely high coercivity value of 29 kOe was obtained from this phase. The as-de
posited Go-Pr films show mainly an amorphous phase. Upon annealing at 500 d
egrees C for 20 min, Co2Pr with the Mg2Cu-type structure was identified in
the Co 35 at. % Pr film. Two phases were identified in the Co 16 at. % Pr f
ilms. Coercivities up to 3.1 kOe were achieved in these films, (C) 1998 Ame
rican Institute of Physics. [S0021-8979(98)30611-8].