A correlation between magnetic induction and surface phenomena has been inv
estigated in a 3% Si steel 0.1 mm thick. During final annealing at several
temperatures, the saturation level in magnetic induction increased with inc
reasing final annealing temperature, and reached 1.93 T after final anneali
ng at 1300 degrees C for 3.9 ks. This is attributed to the formation of com
plete (110)[001] Goss texture. During final annealing, the magnetic inducti
on of the thin-gauged 3% Si strip was inversely proportional to the sulfur
concentration on the surface. The surface segregation of sulfur occurred af
ter a critical time the silicon concentration on the surface dropped to the
level obtained from the ct-iron matrix containing 3% Si. The drop in silic
on level on the thin-gauged strip surface is due to the volatile silicon mo
noxide, which arises from the reaction between the silicon dioxide and the
silicon segregated, or between the silicon segregated and the oxygen from t
he high vacuum condition. (C) 1998 American Institute of Physics. [S0021-89
79(98)41511-1].