Voltage dependence of magnetoresistance in spin dependent tunneling junctions

Citation
J. Zhang et Rm. White, Voltage dependence of magnetoresistance in spin dependent tunneling junctions, J APPL PHYS, 83(11), 1998, pp. 6512-6514
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
83
Issue
11
Year of publication
1998
Part
2
Pages
6512 - 6514
Database
ISI
SICI code
0021-8979(19980601)83:11<6512:VDOMIS>2.0.ZU;2-#
Abstract
The voltage dependence of magnetoresistance in spin dependent tunneling (SD T) junctions was studied experimentally and theoretically. Different magnet oresistance (MR)-V dependence in various patterned junctions was observed a nd correlated with other technologically important parameters, including th e magnitude of the MR, linearity of the current-voltage characteristic, tem perature dependence of the junction resistance, and the MR. A phenomenologi cal model based on a spin-independent two-step tunneling via defect states in the barrier, in addition to the spin-dependent direct tunneling, is prop osed to account for the MR-V dependence. The MR ratio is determined by the ratio of the two currents. The MR-V dependence results from a stronger volt age dependence of the two-step tunneling current compared to that of the di rect tunneling current. The same model also satisfactorily predicts other p roperties of SDT junctions. A high quality barrier is required to minimize the MR-V dependence and improve other junction properties. The approach to achieving desirable junction impedance for data storage applications is dis cussed. (C) 1998 American Institute of Physics. [S0021-8979(98)28311-3].