Nanostructured NdFeB films processed by rapid thermal annealing

Citation
M. Yu et al., Nanostructured NdFeB films processed by rapid thermal annealing, J APPL PHYS, 83(11), 1998, pp. 6611-6613
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
83
Issue
11
Year of publication
1998
Part
2
Pages
6611 - 6613
Database
ISI
SICI code
0021-8979(19980601)83:11<6611:NNFPBR>2.0.ZU;2-O
Abstract
Nanostructured NdFeB films were prepared by magnetron sputtering followed b y rapid thermal annealing at a ramp rate of 200 degrees C/s. Isotropically oriented Nd2Fe14B crystallites were formed in the films and coercivities up to 20 kOe and remanence ratios up to 0.8 were obtained. Transmission elect ron microscopy analysis shows that the majority phase of the magnetic layer in the high coercivity films consists of Nd2Fe14B nanocrystallites with an average size of about 50 nm. These nanocrystallites are believed to be sin gle-domain particles, which are responsible for the high coercivities. MFM measurements show that the domain size is about 500 nm. It is thus indicate d that the 50 nm Nd2Fe14B nanocrystallites are strongly exchange-coupled in to the 500 nm domains and the high remanence ratio originates from this exc hange coupling. (C) 1998 American Institute of Physics.