Overpotential driven perpendicular magnetization of electrodeposited ultrathin cobalt films

Citation
Jl. Bubendorff et al., Overpotential driven perpendicular magnetization of electrodeposited ultrathin cobalt films, J APPL PHYS, 83(11), 1998, pp. 7043-7045
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
83
Issue
11
Year of publication
1998
Part
2
Pages
7043 - 7045
Database
ISI
SICI code
0021-8979(19980601)83:11<7043:ODPMOE>2.0.ZU;2-X
Abstract
Depending on the overpotential applied during electrodeposition of ultrathi n cobalt films (eta = 0.1-2.2 V), either in-plane or out-of-plane magnetiza tion can be stabilized. The regime of high supersaturation in particular al lows to engineer electrodeposited cobalt films on Au(111) that show perpend icular magnetization (in the thickness range from 2 to 8 atomic layers) exa ctly like their ultrahigh vacuum grown counterparts. The film topography de pends on the overpotential as shown by atomic force microscopy: continuous films are obtained at low overpotential whereas high overpotential leads to the formation of islands. The perpendicular magnetization results from a s ubtle thickness dependent competition between the shape and the interface a nisotropy. (C) 1998 American Institute of Physics. [S0021-8979(98)48111-8].