Finite size scaling in the thin film limit

Citation
C. Waldfried et al., Finite size scaling in the thin film limit, J APPL PHYS, 83(11), 1998, pp. 7246-7248
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
83
Issue
11
Year of publication
1998
Part
2
Pages
7246 - 7248
Database
ISI
SICI code
0021-8979(19980601)83:11<7246:FSSITT>2.0.ZU;2-P
Abstract
The thickness dependent spin-polarized electronic structure of strained thi n and ultrathin films of Gd is characterized by a distinct change in the cr itical exponent lambda in the formalism of finite size scaling. The reduced critical exponent in the ultrathin films can be correlated to the increase d dominance of the surface magnetic structure and the increasing paramagnet ic-like behavior of the bulk. (C) 1998 American Institute of Physics. [S002 1-8979(98)34111-0].