RADICAL IMPURITY MECHANISMS FOR HELIUM INCORPORATION INTO BUCKMINSTERFULLERENE

Citation
S. Patchkovskii et W. Thiel, RADICAL IMPURITY MECHANISMS FOR HELIUM INCORPORATION INTO BUCKMINSTERFULLERENE, Helvetica Chimica Acta, 80(2), 1997, pp. 495-509
Citations number
35
Categorie Soggetti
Chemistry
Journal title
ISSN journal
0018019X
Volume
80
Issue
2
Year of publication
1997
Pages
495 - 509
Database
ISI
SICI code
0018-019X(1997)80:2<495:RIMFHI>2.0.ZU;2-A
Abstract
Radical impurity mechanisms for incorporating He into C-60 have been e xamined by semiempirical (MNDO) and density functional (BLYP/3-21G) ca lculations. The key step in these mechanisms is the insertion of He in to C(60)X or C(60)X(2) intermediates generated by adding the impurity X to C-60 (X = H, Me in our model study). Contrary to C-60, several wi ndow-type structures with one broken C,C bond exist as local minima on the MNDO potential surfaces of C(60)X and C(60)X(2), but they are mec hanistically irrelevant due to extremely facile ring closure. Effectiv e activation barriers for the penetration of He through intact hexagon s and various windows are reported for 65 different pathways in C(60)X and C(60)X(2). window-type transition states are stabilized significa ntly when there is a C-X bond involving a C-atom from the broken C,C b ond. The corresponding barriers in C(60)X and C(60)X(2) are much lower than in C-60. This provides some theoretical support for the suggeste d impurity mechanisms even though the computed barriers for X = H, Me are still higher than indicated by the experiment (X unknown).