A new approach to calculate atomic flux divergence by electromigration

In this paper, a new calculation method of the atomic pur divergence used t o predict the formation of electromigration-induced void is proposed by con sidering two-dimensional distributions of current density and temperature a nd also simply considering the line structure of nor only polycrystalline, but also bamboo line. For the verification, electromigration phenomenon nea r the corner of an angled polycrystalline line, which results in two-dimens ional distributions of current density and temperature, is treated as an ex ample. The usefulness of the proposed method is discussed in the light of t he comparison of prediction of void formation near the corner with the expe rimental result.