HEM ESD tests on two types of 0.6 mu m DRAM devices showed that internal ci
rcuit or output driver failures would occur after the input or I/O pins wer
e ESD stressed negative with respect to Vee at ground. These failures occur
red at lower than expected ESD stress voltages due to power-up circuit inte
ractions that either turned-on unique internal parasitic ESD current paths
or disrupted the normal operation of the output pin's ESD protection circui
t. ESD analysis found there exists a set of power-up sensitive circuits and
if placed near a Vee bond pad can result in low voltage ESD failures. (C)
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