Photoluminescence and photoreflectance studies in GaAs/AlxGa1-xAs heterojunctions in the low Al concentration range

Citation
L. Gomez-herrera et al., Photoluminescence and photoreflectance studies in GaAs/AlxGa1-xAs heterojunctions in the low Al concentration range, REV MEX FIS, 44, 1998, pp. 236-239
Citations number
12
Categorie Soggetti
Physics
Journal title
REVISTA MEXICANA DE FISICA
ISSN journal
0035001X → ACNP
Volume
44
Year of publication
1998
Supplement
3
Pages
236 - 239
Database
ISI
SICI code
0035-001X(199812)44:<236:PAPSIG>2.0.ZU;2-6
Abstract
We present results on the optical characterization of AlxGa1-xAs epitaxial layers grown by liquid phase epitaxy with low aluminum concentrations in th e range 0.01 less than or equal to x less than or equal to 0.2. By using th e low temperature photoluminescence spectroscopy (PL) we measured the PL sp ectra and from the analysis of the excitonic recombination band we were abl e to characterize the crystalline quality of the layers. From the PL spectr a we got information also about the presence of impurities and defects in t he layers. The photoreflectance spectroscopy was used to determine the band gap energy of the AlGaAs layer and to study the interface with the GaAs su bstrate.