Micromachining of pure silicon by molecular dynamics

Citation
T. Nozaki et al., Micromachining of pure silicon by molecular dynamics, THIN SOL FI, 334(1-2), 1998, pp. 221-224
Citations number
4
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
334
Issue
1-2
Year of publication
1998
Pages
221 - 224
Database
ISI
SICI code
0040-6090(199812)334:1-2<221:MOPSBM>2.0.ZU;2-G
Abstract
The cutting of nanometer parts has been simulated using molecular dynamics. In this paper single crystals of silicon were cut by idealized tools. The results are compared with those of metals. Pure single crystals of silicon having faces of (111), ((111) over bar), (1(1) over bar 0), (<(1)over bar 1 0>), (11(2) over bar), and (112) were cut by a sharp edge. The potential us ed here was a three-body Stillinger-Weber potential. The depth of the edge was chosen to be one, two and three (111) atomic layers. Single crystals of silicon were found to be harder than those of metals. The plastic deformat ion in silicon was more restricted in a limited area than in metals. The su rface was smoother when the cutting thickness was thicker. Atomic shuffling was not observed. The creation of dislocations depends on the cutting spee d. The chip was always found to be amorphous. (C) 1998 Elsevier Science S.A . All rights reserved.