A novel electrochemical approach for fabrication of photoluminescent erbium-doped porous silicon

Citation
Ml. Gong et al., A novel electrochemical approach for fabrication of photoluminescent erbium-doped porous silicon, APPL PHYS A, 68(1), 1999, pp. 107-110
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
68
Issue
1
Year of publication
1999
Pages
107 - 110
Database
ISI
SICI code
0947-8396(199901)68:1<107:ANEAFF>2.0.ZU;2-1
Abstract
We report a novel electrochemical doping (ECD) approach for porous silicon (PS) with rare earths, constant-potential electrolysis, and a new electroly te solution system. The doped erbium concentration was high: up to 10(21)/c m(3). After this new ECD treatment, PS:Er was found to emit much more inten se room-temperature visible photoluminescence than both the porous silicon control and the PS:Er prepared by constant-current ECD. Room-temperature TR photoluminescence around 1.54 mu m was observed for the first time without any post-doping annealing.