Structural characterization of TiO2 thin films obtained by pulsed laser deposition

Authors
Escobar-Alarcon, L Haro-Poniatowski, E Camacho-Lopez, MA Fernandez-Guasti, M Jimenez-Jarquin, J Sanchez-Pineda, A
Citation
L. Escobar-alarcon et al., Structural characterization of TiO2 thin films obtained by pulsed laser deposition, APPL SURF S, 137(1-4), 1999, pp. 38-44
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
137
Issue
1-4
Year of publication
1999
Pages
38 - 44
Database
ISI
SICI code
0169-4332(199901)137:1-4<38:SCOTTF>2.0.ZU;2-W
Abstract
The structural characterization by Raman spectroscopy and X-ray diffraction of TiO2 thin films obtained by pulsed laser deposition is reported. The su bstrate temperature and the oxygen pressure effects are investigated. The m ain result is that rutile TiO2 thin films are obtained at low substrate tem peratures. The film growth occurred mainly in the (110) direction. (C) 1999 Elsevier Science B.V. AU rights reserved.