This paper presents a wide-band model describing the behavior of an open-en
ded microstrip line illuminated at its termination. The photoinduced carrie
rs create a plasma at the end of the line, which modifies the complex diele
ctric constant and, therefore, also the field configuration. The perturbati
on due to the illumination is modeled by an optically controllable terminat
ion load. Its analytical expression is obtained from the integration of the
conductivity predicted by the plasma theory. Measurements made on devices
fabricated on a silicon substrate validate the model from 0.04 to 20 GHz fo
r an illumination power density of 4 mW/mm(2) at a wavelength of 685 nm, Th
e validation includes the extraction of the characteristic impedance, which
is a complex value because of the low resistivity wafers used (approximate
to 250 Ohm.cm).