Influence of discharge parameters on the resultant sputtered crater shapesfor a radio frequency glow discharge mass spectrometry source

A radio frequency glow discharge mass spectrometry (rf-GDMS) source was eva luated toward future applications in the depth-resolved analysis of both me tallic and nonconducting samples. The effects of the discharge conditions o f rf power, gas pressure; and limiting orifice (anode) diameter were invest igated to determine their influence on sputtering characteristics, resultan t crater shapes, and analyte ion intensities. Other significant variables i ncluding nonconductive sample thickness and sputtering time were also exami ned. These studies rendered information about the respective parameters' ro les in the sputtering process as well as possible ionization mechanisms. Th e ability of the rf-GD mass spectrometric technique to perform depth-resolv ed analysis was demonstrated through depth profiling of a simulated mirror, a superlattice material, and a painted automotive panel.